Stretched Silicon Speeds Semiconductors 60
byrd77 writes: "IBM is touting new 'strained' silicon as being up to 35 percent faster while reducing power requirements. Let's hope this is more than just an exercise in straining credulity..." See also their press release.
Re:IBM press releases are too early (Score:1)
It's smart to show that your pipeline isn't drying up when people are getting nervous about "next steps".
Uhm, take a step back (Score:3)
So why this "LOLOL IBM WANTS MONEY!!!" commentary? They're a corporation, yes, but their inventions have a wonderful impact on computers.
hi, i am a /. bitch (Score:5)
1. It'll never work - thats right, if the Ph.ds at the IBM lab had consulted me and my RPG-playing zit-studded freshmen pals, they would have understood how idiotic they were to pursue this work, and to claim that it was a success.
2. Those greedy bastards - how dare they hold this innovation closely and not share it with openwhatever.org?
3. What does this have to do with linux? Philip Greenspun is cool! Craig Mundie sucks dick! RMS and Linus rule too! Steve Case also sucks dick!
Thank you, this is /. bitch, signing off.
Re:IBM press releases are too early (Score:1)
Re:IBM press releases are too early (Score:1)
you describe:
http://www-4.ibm.com/software/speech/enterprise
-Kevin
How "not exactly"? (Score:1)
Also, I was not talking about the material properties of SiGe - but of strained Si on a SiGe lattice which is exactly what this press release was about.
Going through each of the points that I mentioned as downsides of the technology:
1. Thermal conductivity: this is a property of the bulk material. Even if the SiGe material is epitaxially deposited on a bulk Si wafer, there will still be a substantial layer of SiGe between the transistors and the bulk material. In flip-chip BGA technology cooling of a chip is from the backside - through the substrate. The substantially lower thermal conductivity of the graded SiGe material used to created the strained silicon lattice in the channel is fairly large and will act to isolate the transistors from the backside cooling, which will induced localized self-heating near the transistor. The temperature of the transistor will rise due to this effect which will reduce the mobility of the device.
2. Junction leakage: the lower conduction band in strained Si will lead to reduced Vt within the channel. This reduced Vt will contribute to enhanced switching performance, but will increase Ioff - the source/drain current that flows when the device is supposed to be off. If the process is modified to increase this Vt, then the mobility will be reduced.
3. The dielectric constant of SiGe - which forms the subtrate under the source and drain is substantially higher than the dielectric constant of Si. The parasitic junction cap in the source and drain to the substrate will thus be higher - not substantially but noticeably.
I would be interested to know on what basis you disagree with these three points. I have followed this subject with interest through my career as a microprocessor design engineer and consider myself very familiar with the issues involved and so I am very curious about the details of what they did.
Which leads back to my question - how did IBM solve these issues - particularly the first one - and if they didn't, then what makes this a breakthrough?
What are they doing differently now? (Score:5)
So what is strained silicon - essentially it's a way of using the lattice mismatch of silicon and SiGe (silicon germanium) to create tensile strain near the material interfaces. This strain reduces carrier scattering and thus improves mobility for both electrons and holes in the inversion layer of the transistor channel. So, in less engineering speak, the charge carriers in the transistor move around easier and thus faster which improves transistor performance. This mobility improvement can be as high as 70% faster than 'normal' silicon channels.
It's worth mentioning the downsides of this technique - which I notice have been ignored in all the articles that I have read. Thermal conductivity of strained SiGe is substantially lower than 'normal' silicon - like an order of magnitude less. So the devices will be much hotter. This 'self-heating' of the devices results in reduced mobility of the charge carriers due to increased carrier scattering - so essentially the devices are so much hotter than they greatly reduce the effect that was created in the first place. Another issue is the fact that junction leakage is much higher. And another is that the higher dielectic constant and lower band-gap of SiGe result in higher junction capacitances in the transistors.
The technology is interesting, but I don't see how they managed to address the issues that have held back the technology so far. It's a shame that they didn't mention potential issues and how they worked around them in the press release, but I guess we'll have to wait for the technical papers at this year's conferences.
* Not Speaking for Intel Corp. *
This fits in naturally with SOI (Score:2)
If instead you do epitaxial Si deposition on another insulating crystal, perhaps sapphire, with a lattice slightly larger than Si's, you get the benefits of an SOI process *and* this improvement from a strained lattice.
This is a real technical coup on IBM's part.
As for diffusion, well, IBM can use dopants with lower diffusivities should this be a problem for part longevity.
Going to cost (Score:5)
So, you need to build the silicon on top of a substrate, with a similar crystal surface, but a larger lattice parameter(s). Then grow the silicon on top of it by some technique that maintains atomic level consitancy between the layers.
This is difficult to do - your basically talking something along the lines of silicon deposited by some for of epitaxial growth - and for thick layers that's a timeconsuming process. And thus expensive.
One thing that was not mentioned was the cost of this trick - how does it compare with germanium or gallium arsnide? (Ok, projected to compare?).
I think that, baring some lucky find, this is going to be more expensive than the befefits, for general use.
Not only that, but the interdiffusion coefficents of a strained material are, in general, faster than for the an unstrained material, so this will decrease the lifetime of the devices.
Interesting idea, though.
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Re:Uhm, take a step back (Score:2)
Slashdot provides a forum for some perpetual life nut-job, then questions the credibility of IBM.
I'm beginning to question what on earth these goons are smoking. I'd be scared to try it myself.
Re:Going to cost (Score:5)
True, but all high-performance device wafers start out with a layer of epi anyway to have a higher quality film than CZ (less oxygen intersticials for example).
One thing that was not mentioned was the cost of this trick - how does it compare with germanium or gallium arsnide? (Ok, projected to compare?).
GaAs and Ge are very expensive, and it's hard to produce substrates much larger than 4". I'm sure IBM's strained SiGe can be grown on 12" wafers.
Not only that, but the interdiffusion coefficents of a strained material are, in general, faster than for the an unstrained material, so this will decrease the lifetime of the devices.
Also true, which is a concern at front-end processing temperatures, but this is typically not a failure method at room temperature.
This is not to say that there aren't a lot of manufacturing and reliability issues associated with SiGe devices.
Great.... (Score:2)
This must by the first time in months an AC has been moderated up to +5.
Wow. I'm not the only guy who moderates at -1...
-grendel drago
IBM press releases are too early (Score:1)
But I'm still waiting to see any product that uses their discoveries. It's so disapointing "yeah, we have something that really rocks. But you can't buy it now".
IBM does a marvellous research work, but maybe their press releases are coming too early, they give us fale hopes.
Wonderful (Score:2)
I give up, where's my 486?
Sounds useful... (Score:2)
That would kind of make overclockers shoot themselves in the foot.
Re:It's a neat idea... (Score:2)
Don't be too discouraged. Copper interconnects in IBM's chips didn't take nearly as long as I saw some people predicting.
Re:IBM press releases are too early (Score:2)
Depends.
Sometimes IBM manages to get stuff out fairly quickly(like copper interconnects on chips).
OTOH, I think it's been about a decade since I watched on CNN a demo of IBM voice-recognition software that was supposed to eliminate the need for keyboards, and allow you to easily dictate in documents, where synonyms ("to", "too", "2", et cetra) were corrected based on context and so on.
I couldn't help but notice however, how in the demo the software kept getting ahead of the demonstrator, "correctly predicting" and displaying things like a specific noun in a sentence before it was uttered, evidently based merely on her having begun the sentence with the word "The"...
Re:They still lay this out in two dimensions ... (Score:2)
Probably when they develop a 4-dimensional projector that will allow them to project a solid shadow of a 3-D mask into the inside of a block of silicon, and a teleportation device to get the dopant atoms inside.
Re:They still lay this out in two dimensions ... (Score:1)
I am not sure which is more likely
Stretched Silicon Speeds Semiconductors (Score:2)
Way to go Joan.
Oh, _silicon_!
Re:Just another brick in the wall .... (Score:1)
I must admit I only read the press release link which only refers to '35%' not '70%' - 35% is reasonable from 70% if you assume that delays are evenly shared between gates and nets - of course my experience is that while that's true for most paths the ones that come and bite you are the long nets that are mostly RC
Just another brick in the wall .... (Score:3)
These days even process shrinks don't give use the speedups they used to (edge effects, RC delays and all that) - however everylittle bit helps - 35% faster silicon probably means 10% faster chips overall - what we really need is a new way to do interconnect - lasers? room temp superconductors? quantum comunications ["I put a cat in my box I don't know if it's dead why don't you check to see if there's any food missing at your end?" :-]? esp? etc etc
Re:Who hoo! Maybe my kids will benefit from this. (Score:1)
Aticle at Yahoo has a picture (Score:3)
Re:hi, i am a /. bitch (Score:1)
-- And believing that scientific knowledge should be available to everyone? Yes, IBM paid to discover it. No, that doesn't make the knowledge theirs. If I discover it tomorrow, I'll do with it as I choose (no disrespect to the researchers at IBM or the people who support them).
I can't demand that IBM provide it to openwhatever.org, but there's nothing wrong with asking!
Re:Just another brick in the wall .... (Score:1)
--
linkage (Score:4)
Since this guy beat me to the punch on the submission, here's the link to the CNN story that I included: http://www.cnn.com/2001/TECH/ptech/06/08/ibm.silic on.ap/index.html [cnn.com]. Just in case anybody wanted it.
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Re:too late... (Score:1)
Toshiba's X Architecture (Score:2)
Still with the X Architecture [cnn.com] claiming 10% better peformance and 20% less power dicipation combined with the 30% gains IBM claims, there is turning out to be a lot more room before we hit the physical limit of Moore's law.
Cool.
Re:Going to cost (Score:2)
One thing that was not mentioned was the cost of this trick - how does it compare with germanium or gallium arsnide? (Ok, projected to compare?).
Neither Ge nor GaAs (or any other III-V compound for that matter) can be used to produce ICs using "standard" Si fabrication techniques. The most important reason is the lack of a suitable native oxide for use as the gate dielectric. GeO2 is water soluble, and oxide on GaAs cannot be grown uniformly or with good quality.
That being said, ICs are produced on GaAs, but using different types of transistors. However, the amount of experience that would have to be acquired to produce, for example, a pentium on GaAs is staggering. In other words, it will not happen any time soon.
Re:Just another brick in the wall .... (Score:1)
Does anyone know if this works alongside SOI? And where will these chips wind up? My bet is Apples, since (IIRC) SOI is on the G4 chip.
Re:Just another brick in the wall .... (Score:2)
Cnet (Score:3)
Real or Windows Media only.
Re:Who hoo! Maybe my kids will benefit from this. (Score:3)
Re:Going to cost (Score:2)
Your general facts are all correct, however it's been under research for ages. The optoelectronics used at the ends of fiber optics is nearly all strained or strain-compensated quaternary (mix of four seperate types of atoms) semiconductor compounds grown using the epitaxial methods you metion.
What I presume that this announcement really means is that IBM has now solved all the very problems you describe, to the point where they are now planning on putting it into production.
Re:hi, i am a /. bitch (Score:1)
If IBM has patented this new manufacturing process (and I'm sure that they have) however, nobody else will be able to use it without working out a licensing agreement with IBM, unless they wanted to get slapped with a lawsuit.
The scientific knowledge is available to everyone to use and expand upon, but IP law protects IBM's investment from being used by its competetitors -- the IP is a competetive advantage for IBM. What's wrong with that?
Re:Going to cost (Score:2)
Everyone has been using copper for a hell of a long time, and it does the same thing. The interdiffusivity of copper is horrible, and it doesn't stop them from using it. I imagine that this technology has a chance of making it. Just like C-Nanotubes, they make progress on mass-producing these kinds of effects every day.
Re:Just another brick in the wall .... (Score:3)
In the strained silicon, electrons experience less resistance and flow up to 70 percent faster, which can lead to chips that are up to 35 percent faster - without having to shrink the size of transistors.
So, um read the article, please. ...
From the article...
price? (Score:1)
historically, stretching has been important. (Score:1)
for example:
Edwin Land's Polaroid sheets were plasic stretched "just so", aligning the molecules
to allow only polarized light to pass. The instant cameras came later.
Gore-Tex is a membrane that allows H20-vapor to pass but blocks H20 drops. It is
made by sretching teflon "just so", inducing holes of the correct diameter.
Spring steel is stretched so that the molecules in the alloy align in a way to give it that property.
Straining Credulity? (Score:2)
Well, it isn't straining credulity, I read it on Slashdot so it HAS to be true!
Re:too late... (Score:1)
Who hoo! Maybe my kids will benefit from this. (Score:2)
Just an observation.
Re:hi, i am a /. bitch (Score:1)
Whatcha doooo with those rollin' papers?
Make doooooobieees?
Re:hi, i am a /. bitch (Score:2)
4. I didn't understand or even read the underlying post but I'm commenting anyway - Stra1n3d P3as h4ve n0th1ng t0 d0 w1th f4st3r c0pmutters. 1'm unda 2 much str3ss 4s 1t 15! IBM 5uck5!
Re:IBM press releases are too early (Score:1)
Re:hi, i am a /. bitch (Score:1)
You also forgot "old news! we were doing research on these back in 1816 already when i was a grad student at MIT, they're not great".
Re:linkage (Score:2)
Re:Who hoo! Maybe my kids will benefit from this. (Score:1)
new tech?? (Score:1)
In 2003 surly current develpoment tech will be implemented which will not require any silicon tech. most devlopment tech utilise GaAs and other substrates. nano tech is also speeding up the move away from si tech. Intramolecular tech will remove the need altogether.
end of rant
Re:Uhm, take a step back (Score:1)
Is IBM the only one studying silicon? (Score:1)
Press releases, Hmph - they didn't "discover" jack (Score:2)
If my Mom was reading their press release and all the drooling media blather on it, she'd be left with the impression that IBM had just invented something new and spectacular.
They haven't. Strained semiconductor production and use has been in the labs for *ages*. Nortel and every other company making lasers and optoelectronics components for fiber-optics systems have been using much more exotic strain-compensated quaternary (compound) semiconductor materials systems for ages. And it was all originally "discovered" in public research institutions and universisites.
All IBM has done is figured out how to work it into their current production line (which is in fact quite an accomplishment).
Let me know when AMD gets strain compensated SiGe into their CPUs. Then I'll get excited.
Re:Toshiba's X Architecture (Score:1)
A lot of these chip architectures, including the ones we have been seeing lately from AMD, Intel, IBM etc have been concentrating on getting the most out of existing silicon. That is because industries do not want to write off existing fabs. A lot of research goes on interconnect technologies in Europe, and I wonder when all these technologies would be put together. At one point of time, the cost of productising any new technology will become too big even for the biggies, and then mergers will start happening, like in any other industry. Again, money wins.
The other alternative is to have completely different paradigms of computing like biochips and Quantum comps.
Press release (Score:1)
It's a neat idea... (Score:1)
43rd Law of Computing:
Re:Odds are its a lie (Score:1)
I don't think it is. IBM is a fairly stable company and has been around since before computers. They have no reason to lie, not to mention the fact that they are always doing R&D, and therefore often release news about their developments. If I had money to invest, IBM would be one of my top choices...
Re:too late... (Score:1)
Re:too late... (Score:1)
too late... (Score:2)