Submission + - IBM to Produce 22 nm Chips by 2011 (theregister.co.uk)
Ana10g writes: IBM is introducing a series of fabrication technologies with which they can produce processors etched at the 22 nanometer level, without using X-Ray lithography. Instead, researchers have figured out how to etch the chips using the more traditional laser etching process, albeit focusing the laser using a layer of water in which the silicon is immersed. FTA:
With immersion lithography, the laser light beams that are used to etch circuits into photosensitive material on silicon wafers are focused by a layer of water that surrounds the wafer. Because light slows down when it enters the water, you can crank the light up to a higher frequency, which yields a tighter laser beam — and the ability to etch smaller circuits.
The whole story can be read here