177352227
submission
BrianFagioli writes:
Well, it has finally happened. Fedora Linux is now officially available as a Windows Subsystem for Linux (WSL) distribution! Thatâ(TM)s right, folks, following prior testing, you can now run Fedora 42 natively inside Windows using WSL. As someone who considers Fedora to be my favorite Linux distribution, this is a pretty exciting development.
Installing it is simple enough. Just open up a terminal and type wsl --install FedoraLinux-42 to get started. After that, launch it with wsl -d FedoraLinux-42 and set your username. No password is required by default, and youâ(TM)ll automatically be part of the wheel group, meaning you can use sudo right out of the gate.
177237115
submission
schwit1 writes:
The new transistor runs 40% faster and uses less power.
With a slender sheet of lab-grown bismuth and an architecture unlike anything inside today’s silicon chips, they’ve built what they call the world’s fastest and most efficient transistor. Not only does it outperform the best processors made by Intel and TSMC, but it also uses less energy doing so. And most important of all, there’s no trace of silicon involved.
This two-dimensional, silicon-free transistor represents a radical rethinking of what chips can be and how they can be made.
Rather than silicon, the Peking University team built their transistor using bismuth oxyselenide (BiOSe) for the channel, and bismuth selenite oxide (BiSeO) as the gate material.
These materials are part of a class known as two-dimensional semiconductors — atomically thin sheets with exceptional electrical properties. Bismuth oxyselenide, in particular, offers something silicon struggles with at ultra-small sizes: speed.
Electrons move through it faster, even when packed into tiny spaces. It also has a higher dielectric constant, meaning it can hold and control electric charge more efficiently. That makes for faster switching, reduced energy loss, and — very importantly — a lower chance of overheating.
“This reduces electron scattering and current loss, allowing electrons to flow with almost no resistance, akin to water moving through a smooth pipe,” Peng explained.
The interface between these materials is also smoother than that of common semiconductor-oxide combinations used in industry today. That means fewer defects and less electrical noise.
All of this adds up to stunning results. According to the team, their transistor can run 40% faster than today’s most advanced 3-nanometer silicon chips — and it does so while using 10% less energy.
