There is an alternative technology for the production of EUV light at lithography power levels. Zplasma Stable DPP uses Sheared Flow Stabilization to stabilize the EUV-emitting plasma. Stable plasma results in light pulses that are 10-100 times longer than than those produced by the unstable plasmas of other sources. The source uses no tin and has a controlled end to each pulse that does not produce the high-energy debris and molten tin sputtering that have been obstacles for other light sources. We have prototyped and demonstrated the physics of Stable DPP in the lab. Zplasma is seeking funding and development partners to scale our prototype up to the 200 watt light source the industry needs. http://zplasma.com.

There is an alternative technology for the production of EUV light at lithography power levels. Zplasma Stable DPP uses Sheared Flow Stabilization to stabilize the EUV-emitting plasma. Stable plasma results in light pulses that are 10-100 times longer than than those produced by the unstable plasmas of other sources. The source uses no tin and has a controlled end to each pulse that does not produce the high-energy debris and molten tin sputtering that have been obstacles for other light sources. We have prototyped and demonstrated the physics of Stable DPP in the lab. Zplasma is seeking funding and development partners to scale our prototype up to the 200 watt light source the industry needs. http://zplasma.com.