Comment lithography applications (Score 1) 61
So this would presumably be used for extreme ultraviolet lithography?
I guess this paragraph from the Wikipedia article may be relevant:
A further characteristic of the plasma-based EUV sources under development is that they are not even partially coherent, unlike the KrF and ArF excimer lasers used for current optical lithography. Further power reduction (energy loss) is expected in converting incoherent sources (emitting in all possible directions at many independent wavelengths) to partially coherent (emitting in a limited range of directions within a narrow band of wavelengths) sources by filtering (unwanted wavelengths and directions). On the other hand, coherent light poses a risk of monochromatic reflection interference and mismatch of multilayer reflectance bandwidth.