Compare Ansys Additive Suite vs. Sentaurus Process

The Ansys Additive Suite provides essential insights that help designers, engineers, and analysts prevent build failures while ensuring that parts meet precise design specifications. This all-encompassing solution covers the full spectrum of the workflow, which includes design for additive manufacturing (DfAM), validation, print design, process simulation, and material exploration. Within the Additive Suite, users have access to tools such as Additive Prep, Print, and Science, along with Ansys Workbench Additive. Many features in Ansys Workbench allow for the creation of parametric analysis systems, enabling the examination and optimization of various parameters like part orientation and positioning. This suite is offered as an additional module for those holding an Ansys Mechanical Enterprise license. The integration of these tools facilitates a more streamlined approach to additive manufacturing, enhancing the overall efficiency and reliability of the production process.

Sentaurus Process serves as a sophisticated simulator in one, two, and three dimensions, specifically designed for the advancement and fine-tuning of silicon semiconductor process technologies. This next-generation tool effectively tackles the complexities associated with both contemporary and forthcoming process technologies. Featuring an array of cutting-edge process models, including standardized parameters that have been calibrated using data from equipment manufacturers, Sentaurus Process offers a robust framework for accurately simulating a diverse spectrum of technologies, ranging from nanoscale CMOS to expansive high-voltage power devices. Additionally, it integrates seamlessly into a complete suite of essential TCAD products, facilitating multi-dimensional simulations of processes, devices, and systems through an intuitive user interface. With its capabilities for rapid prototyping, development, and optimization, Sentaurus Process enables extensive physics-based process modeling. Furthermore, it allows for the enhancement of device performance by carefully optimizing the thermal and mechanical stress within process structures, accounting for historical stress factors. In this way, Sentaurus Process not only addresses current needs but also prepares users for future technological advancements.