Sentaurus Process Description
Sentaurus Process serves as a sophisticated simulator in one, two, and three dimensions, specifically designed for the advancement and fine-tuning of silicon semiconductor process technologies. This next-generation tool effectively tackles the complexities associated with both contemporary and forthcoming process technologies. Featuring an array of cutting-edge process models, including standardized parameters that have been calibrated using data from equipment manufacturers, Sentaurus Process offers a robust framework for accurately simulating a diverse spectrum of technologies, ranging from nanoscale CMOS to expansive high-voltage power devices. Additionally, it integrates seamlessly into a complete suite of essential TCAD products, facilitating multi-dimensional simulations of processes, devices, and systems through an intuitive user interface. With its capabilities for rapid prototyping, development, and optimization, Sentaurus Process enables extensive physics-based process modeling. Furthermore, it allows for the enhancement of device performance by carefully optimizing the thermal and mechanical stress within process structures, accounting for historical stress factors. In this way, Sentaurus Process not only addresses current needs but also prepares users for future technological advancements.
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